FlashScan™ Reticle Blank Inspection System - KLA-Tencor
FlashScan™ Reticle Blank Inspection System
Project Overview
Contributed to the development of KLA-Tencor’s FlashScan™ reticle blank inspection product line, a groundbreaking system for inspecting reticle blanks used in optical and extreme ultraviolet (EUV) lithography. This project marked KLA-Tencor’s entry into the dedicated reticle blank inspection market, leveraging decades of expertise in semiconductor inspection technology.
Key Contributions
- Precision Inspection Systems: Designed mechanical components for high-sensitivity reticle blank inspection systems
- EUV Technology Integration: Developed hardware solutions for detecting defects on EUV reticle blanks, addressing critical challenges in next-generation lithography
- High-Throughput Design: Engineered systems balancing sensitivity requirements with production speed demands
- Multi-Channel Detection: Contributed to mechanical design supporting three-channel defect detection, classification, and sizing capabilities
Technical Innovation
The FlashScan systems leverage laser scattering technology to inspect reticle blanks for:
- Defect Detection: Captures pinholes in photoresist, fall-on particles, and various defect types on bare substrates and absorber films
- EUV Blank Inspection: Addresses the challenge of manufacturing defect-free EUV blanks, critical for next-generation chip production
- High Sensitivity: Superior defect detection capabilities compared to other systems on the market
- Broad Coverage: Meets requirements for all optical and EUV blanks in production or development
Industry Impact
“Advanced lithography begins with a well-characterized reticle blank. Defect-free EUV blanks have been notoriously difficult to manufacture, driving up costs and delaying the benefits that EUV lithography may bring to next-generation chip manufacturing.” - Dr. Yalin Xiong, General Manager, Reticle and Broadband Plasma Wafer Inspection Division, KLA-Tencor
The FlashScan product line accelerates cycles of learning for blank manufacturers and mask shops, enabling:
- Improved defect control during process development and volume manufacturing
- Enhanced incoming inspection and process monitoring for reticle manufacturers
- Advancement of EUV lithography technology for next-generation semiconductors
Technologies
Reticle Inspection • EUV Lithography • Laser Scattering Technology • Defect Detection • Precision Optics • Semiconductor Manufacturing • Advanced Metrology • High-Sensitivity Inspection
Company: KLA-Tencor Corporation
Location: Milpitas, CA
More Info: FlashScan Product Announcement