Semiconductor Equipment Design - CXRO/Lawrence Berkeley National Lab
Semiconductor Equipment Design for CXRO
Project Overview
Contributed to the development of advanced automation systems and robotics for semiconductor front-end applications at the Center for X-Ray Optics (CXRO) at Lawrence Berkeley National Laboratory.
Key Contributions
- EUV Lithography Tools: Designed mechanical systems for extreme ultraviolet (EUV) microscopy and mask inspection tools
- Precision Automation: Developed robotic handling systems for semiconductor wafer and photomask manipulation
- Nanometer-Scale Precision: Engineered systems requiring sub-nanometer positioning accuracy for cutting-edge semiconductor research
- Front-End Equipment: Specialized in automation solutions for semiconductor manufacturing front-end processes
Technical Impact
The CXRO facility operates some of the world’s highest-resolution EUV microscopes, including:
- SHARP: High-NA mask-imaging microscope for semiconductor mask defect characterization
- MET5: EUV projection lithography tool with 9 nm optical resolution
- AIRES: Ultrahigh resolution zoneplate microscopy for mask imaging studies
Technologies
CAD Design • Precision Mechanics • Robotics • Semiconductor Equipment • EUV Technology • Nanometer-Scale Systems
Client: Lawrence Berkeley National Laboratory - Center for X-Ray Optics
Location: Berkeley, CA
More Info: CXRO Engineering Projects